Facilities
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Spectroscopy
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XPS/UVS
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| Description |
This surface analysis UHV system is fully configured for turn-key operation using dedicated Electron Spectroscopy for Chemical Analysis. The analysis chamber is equipped with a hemispherical analyser with five channeltron detection and monochromated X-ray source for XPS, UV lamp for UPS, LEED, electron gun and ion sputtering. The analysis chamber provides a sample holder with fixed analysis position and floating sample potential, parking stage for samples and a sample transfer via wobble stick. A sample introduction system with a magnetically coupled transporter enables loading of multiple samples at one time. |
| Manufacturer |
Omicron Nanotechnology, UK. |
| Model |
Omicron Multiprobe Electron Spectroscopy System. |
| Installation place & date |
Room No. 126 & April 2004. |
| System base pressure |
2.5×10-10 mbar. |
| Sample size |
10mm × 10mm. |
| Temperature range |
Room (~297 K) to 1170 K |
| Excitation Sources: |
* |
| X-ray source |
Monochromated Al Kα (1486.7 eV) (Model: XM 500). |
| UV source |
He I (21.2eV) (Model: HIS 13). |
| Electron source |
E=0-3500eV; beam current > 30µA with LaB6 filament (Model: SL 1000). |
| Ion source |
Emax =5keV; >4µA sample current, <1000 m="" spot="" at="" fine="" focus="" model:="" ise="" 100="" td=""> |
| Electron Spectrometer |
True 180o hemispherical energy analyzer with five channeltron detector for XPS, AES, UPS. (Model: EA 125). Resolution ~0.6 eV (XPS)/100 meV (UPS). |
| LEED |
Beam energy < 5 eV-3.5 keV; filament: WTh (Model: SPECTALEED). |
| Deposition |
E-Beam Evaporator; Temperature range: 300-3300 oC (depending on size of evaporant); 5-20 mm deposition area. (Model: EFM 3). |
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Last Updated on Wednesday, 17 August 2016 14:32
