| Growth | Sputtering system |
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| Description | DC and RF sputtering system |
| Manufacturer | Korea Vacuum Technologies Company Limited, South Korea |
| Model | Nil |
| Installation place & date | Room No. # 125 & July, 2006 |
| Key Features | Two DC and one RF target Deposition pressure control Substrate heating (500 °C) Ar, O2 and N2 gases |
| Users | SINP |