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FACILITIES

Growth Sputtering system
Description DC and RF sputtering system

Manufacturer Korea Vacuum Technologies Company Limited, South Korea

Model Nil

Installation place & date Room No. # 125 & July, 2006

Key Features Two DC and one RF target
Deposition pressure control
Substrate heating (500 °C)
Ar, O2 and N2 gases

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Last Updated on Tuesday, 11 August 2026 12:14
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