Morphology of thin silver film grown by dc sputtering on Si(001)
S. Kundu1, S. Hazra1, S. Banerjee1, M. K. Sanyal1, S. K. Mandal2, S. Chaudhuri2 and A. K. Pal2
1 Surface Physics Division, Saha Institute of Nuclear Physics, 1/AF Bidhannagar, Calcutta 700 064, India
2 Department of Materials Science, Indian Association for the Cultivation of Science, Jadavpur, Calcutta 700 032, India

The morphology and growth mechanism of silver films approximately 150 Å in thickness on Si(001) substrates have been studied by atomic force microscopy and x-ray reflectivity. The thin films prepared by dc sputtering at room temperature are composed of islands of silver. The shape and size distribution of these islands are studied using these two complementary measurement techniques.